Study on the interface reduction of Cr/SiO2 film

被引：0
|
作者：
Zhu, Yongfa [1 ]
Mao, Dong [1 ]
Cao, Lili [1 ]
机构：
[1] Tsinghua Univ, Beijing, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology | 1996年 / 16卷 / 02期
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(Edited Abstract)
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页码：81 / 86
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