Study on the interface reduction of Cr/SiO2 film

被引：0
|
作者：
Zhu, Yongfa [1 ]
Mao, Dong [1 ]
Cao, Lili [1 ]
机构：
[1] Tsinghua Univ, Beijing, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology | 1996年 / 16卷 / 02期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
(Edited Abstract)
引用
收藏
页码：81 / 86
相关论文
共 50 条
  • [21] INVESTIGATION OF SIO2 SURFACE TOPOGRAPHY AND SIO2 INTERFACE STRUCTURE
    ONO, K
    YASHIRO, T
    YAGI, S
    REVIEW OF THE ELECTRICAL COMMUNICATIONS LABORATORIES, 1969, 17 (1-2): : 70 - &
  • [22] Reduction processes in Cu/SiO2, Co/SiO2, and CuCo/SiO2 catalysts
    Smith, Miranda L.
    Campos, Andrew
    Spivey, James J.
    CATALYSIS TODAY, 2012, 182 (01) : 60 - 66
  • [23] SPUTTERING EFFECTS IN SI, SIO2 AND THE SI/SIO2 INTERFACE
    DOWNEY, SW
    EMERSON, AB
    SURFACE AND INTERFACE ANALYSIS, 1993, 20 (01) : 53 - 59
  • [24] Potential energy landscape of an interstitial O2 molecule in a SiO2 film near the SiO2/Si(001) interface
    Ohta, Hiromichi
    Watanabe, Takanobu
    Ohdomari, Iwao
    PHYSICAL REVIEW B, 2008, 78 (15)
  • [25] Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test
    Zhou, Xilin
    Wu, Liangcai
    Song, Zhitang
    Rao, Feng
    Ren, Kun
    Peng, Cheng
    Guo, Xiaohui
    Liu, Bo
    Feng, Songlin
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (09)
  • [26] SIO2 FILM DECOMPOSITION REACTION INITIATED BY CARBON IMPURITIES LOCATED AT A SI-SIO2 INTERFACE
    RAIDER, SI
    HERD, SR
    WALKUP, RE
    APPLIED PHYSICS LETTERS, 1991, 59 (19) : 2424 - 2426
  • [27] SiO2 valence band near the SiO2/Si(111) interface
    Musashi Inst of Technology, Tokyo, Japan
    Appl Surf Sci, (119-122):
  • [28] Reduction and desorption with carbon monoxide in Cr/SiO2 catalysts for ethylene polymerization
    Gaspar, AB
    Dieguez, LC
    JOURNAL OF MOLECULAR CATALYSIS A-CHEMICAL, 2004, 219 (02) : 357 - 362
  • [29] HIGH-TEMPERATURE SIO2 DECOMPOSITION AT THE SIO2/SI INTERFACE
    TROMP, R
    RUBLOFF, GW
    BALK, P
    LEGOUES, FK
    VANLOENEN, EJ
    PHYSICAL REVIEW LETTERS, 1985, 55 (21) : 2332 - 2335
  • [30] SiO2 valence band near the SiO2/Si(111) interface
    Nohira, H
    Hattori, T
    APPLIED SURFACE SCIENCE, 1997, 117 : 119 - 122
12345