Ion beam analysis with monolayer depth resolution

被引:0
|
作者
Carstanjen, H.D. [1 ]
机构
[1] Max-Planck-Inst fuer Metallforschung, Stuttgart, Germany
关键词
D O I
暂无
中图分类号
学科分类号
摘要
13
引用
收藏
页码:1183 / 1190
相关论文
共 50 条
  • [41] Enhanced depth resolution in positron analysis of ion irradiated SiO2 films
    Simpson, PJ
    Spooner, M
    Xia, H
    Knights, AP
    JOURNAL OF APPLIED PHYSICS, 1999, 85 (03) : 1765 - 1770
  • [42] Enhanced depth resolution in positron analysis of ion irradiated SiO2 films
    Department of Physics and Astronomy, University of Western Ontario, London, Ont. N6A 3K7, Canada
    不详
    J Appl Phys, 3 (1765-1770):
  • [43] In-air ion beam analysis with high spatial resolution proton microbeam
    Jaksic, M.
    Chokheli, D.
    Fazinic, S.
    Grilj, V.
    Skukan, N.
    Sudic, I.
    Tadic, T.
    Anticic, T.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2016, 371 : 185 - 188
  • [44] Depth resolution improvement in secondary ion mass spectrometry analysis using metal cluster complex ion bombardment
    Tomita, M.
    Kinno, T.
    Koike, M.
    Tanaka, H.
    Takeno, S.
    Fujiwara, Y.
    Kondou, K.
    Teranishi, Y.
    Nonaka, H.
    Fujimoto, T.
    Kurokawa, A.
    Ichimura, S.
    APPLIED PHYSICS LETTERS, 2006, 89 (05)
  • [45] Effects of Ga ion-beam irradiation on monolayer graphene
    Wang, Quan
    Mao, Wei
    Ge, Daohan
    Zhang, Yanmin
    Shao, Ying
    Ren, Naifei
    APPLIED PHYSICS LETTERS, 2013, 103 (07)
  • [46] In-depth distribution of ion beam damage in SiC
    Sulyok, A.
    Menyhard, M.
    Malherbe, J. B.
    VACUUM, 2012, 86 (06) : 761 - 764
  • [47] DEPTH PROFILING BY ION MICROPROBE WITH HIGH MASS RESOLUTION
    DEGREVE, F
    FIGARET, R
    LATY, P
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1979, 29 (04): : 351 - 361
  • [48] Study on the sensitive element of ion beam etching depth
    Zhao, GX
    Yang, GG
    Chen, HQ
    MEASUREMENT, 2000, 27 (04) : 287 - 289
  • [49] TEMPERATURE, ROUGHNESS AND DEPTH RESOLUTION IN ION SPUTTER PROFILES
    SEAH, MP
    KUHLEIN, M
    SURFACE SCIENCE, 1985, 150 (01) : 273 - 288
  • [50] DEPTH RESOLUTION IN ION SPUTTERING - AN ASPECT OF QUANTITATIVE MICROANALYSIS
    GIBER, J
    MARTON, D
    LASZLO, J
    JOURNAL DE PHYSIQUE, 1984, 45 (NC-2): : 115 - 118