ACCURATE CAD MODEL FOR THE AMBIPOLAR a-Si:H TFT.

被引:0
|
作者
Neudeck, Gerold W. [1 ]
Chung, Kyo Y. [1 ]
Bare, Harold F. [1 ]
机构
[1] Purdue Univ, West Lafayette, IN, USA, Purdue Univ, West Lafayette, IN, USA
关键词
D O I
暂无
中图分类号
学科分类号
摘要
11
引用
收藏
页码:866 / 871
相关论文
共 50 条
  • [41] 2.7”a-Si TFT矩阵(英文)
    熊绍珍
    孟志国
    代永平
    周祯华
    张建军
    李庄诚
    卢桂章
    液晶通讯, 1993, (03) : 88 - 93
  • [42] Scaling of a-Si TFT Gate Drivers
    Jang, Yong Ho
    Kim, Hae Yeol
    Kim, Binn
    Choi, Seung Chan
    Cho, Hyung Nyuck
    Ryoo, Chang Il
    Choi, Wooseok
    Yoon, Soo Young
    Park, Kwon-shik
    Moon, Taewoong
    Cho, Nam Wook
    Kim, Chang-Dong
    2009 SID INTERNATIONAL SYMPOSIUM DIGEST OF TECHNICAL PAPERS, VOL XL, BOOKS I - III, 2009, : 1088 - 1091
  • [43] THE EFFECT OF a-SiN:H AND a-Si:H SURFACE ROUGHNESS OF TFT BY PE/RACVD
    Kim, Jin-Eui
    Ryu, Sang-Hyuk
    Choi, Sie-Young
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2010, 24 (15-16): : 3107 - 3111
  • [44] Interpretation of mechanism determining field effect mobility in a-Si:H TFT based on surface reaction model
    Chida, Y
    Kondo, M
    Matsuda, A
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1996, 198 : 1121 - 1124
  • [45] A self-consistent model for defect states in a-Si and a-Si:H
    Lucovsky, Gerald
    Phillips, Jim
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2007, 18 (Suppl 1) : S463 - S467
  • [46] A self-consistent model for defect states in a-Si and a-Si:H
    Gerald Lucovsky
    Jim Phillips
    Journal of Materials Science: Materials in Electronics, 2007, 18 : 463 - 467
  • [47] On the reaction between a-Si and Mo in an a-Si thin-film transistor (TFT)
    Zhao, Ying
    Xiong, Shaozhen
    Wang, Zongpan
    Meng, Zhiguo
    Dai, Yongping
    Zhou, Zhenhua
    Zhang, Jianjun
    Yao, Lun
    Guangdianzi Jiguang/Journal of Optoelectronics Laser, 1999, 10 (02): : 102 - 106
  • [48] Energy barrier limited transport mechanism for turn-on a-Si:H TFT
    Chen, Stephen Hsin-Li
    Tsai, Chien-Chien
    Chen, Tung-Yu
    Wei, Kevin
    Yang, Red
    IDMC 05: PROCEEDINGS OF THE INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE 2005, 2005, : 436 - 437
  • [49] 不同双栅极设计对a-Si:H TFT特性影响
    林致远
    马骏
    林亮
    杨成绍
    邹志翔
    黄寅虎
    文锺源
    王章涛
    液晶与显示, 2016, 31 (05) : 460 - 463
  • [50] a-Si∶H TFT亚阈值区SPICE模型的研究
    邵喜斌
    王丽娟
    李梅
    液晶与显示, 2005, (04) : 267 - 272