Al-Cu alloy etching using in-reactor aluminium chloride formation in static magnetron triode reactive ion etching

被引：0
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作者：
Sato, Masaaki [1 ]
Arita, Yoshinobu [1 ]
机构：
[1] NTT LSI lab, Kanagawa, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1993年 / 32卷 / 6 B期
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页码：3013 / 3018
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