Novel static magnetron triode reactive ion etching

被引：0
|
作者：
机构：
[1] Sato, Masaaki
[2] Arita, Yoshinobu
来源：
Sato, Masaaki | 1993年 / 31期
关键词：
10;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] NOVEL STATIC MAGNETRON TRIODE REACTIVE ION ETCHING
    SATO, M
    ARITA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1992, 31 (6B): : 1993 - 1998
  • [2] Al-Cu alloy etching using in-reactor aluminium chloride formation in static magnetron triode reactive ion etching
    Sato, Masaaki
    Arita, Yoshinobu
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1993, 32 (6 B): : 3013 - 3018
  • [3] AL-CU ALLOY ETCHING USING IN-REACTOR ALUMINUM-CHLORIDE FORMATION IN STATIC MAGNETRON TRIODE REACTIVE ION ETCHING
    SATO, M
    ARITA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1993, 32 (6B): : 3013 - 3018
  • [4] TRIODE TYPE REACTIVE ION ETCHING SYSTEM
    SHIBAYAMA, H
    OGAWA, T
    KOBAYASHI, K
    KOSUGI, M
    HISATSUGU, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C108 - C108
  • [5] APPARATUS FOR REACTIVE ION ETCHING IN MAGNETRON DISCHARGE
    KIZIITOV, KM
    KORZH, IA
    VOLYNKIN, AA
    INSTRUMENTS AND EXPERIMENTAL TECHNIQUES, 1988, 31 (02) : 507 - 509
  • [6] ION-BEAM ENHANCED MAGNETRON REACTIVE ION ETCHING
    CHINN, JD
    APPLIED PHYSICS LETTERS, 1987, 51 (24) : 2007 - 2009
  • [7] MAGNETRON-ENHANCED REACTIVE ION ETCHING.
    Grebe, K.R.
    Palmer, M.J.
    Yeh, J.T.
    IBM technical disclosure bulletin, 1983, 26 (7 B): : 3848 - 3851
  • [8] DAMAGE-FREE DRY ETCHING WITH A TRIODE-TYPE REACTIVE ION ETCHING SYSTEM
    SHIBAYAMA, H
    KOSUGI, M
    HISATSUGU, T
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1981, 17 (03): : 85 - 103
  • [9] CHARACTERIZATION OF A SPLIT CATHODE MAGNETRON REACTIVE ION ETCHING APPARATUS
    BOBBIO, S
    HO, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C437 - C437
  • [10] CHARGE BUILDUP IN MAGNETRON-ENHANCED REACTIVE ION ETCHING
    HOGA, H
    ORITA, T
    YOKOYAMA, T
    HAYASHI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11B): : 3169 - 3173
12345