Effect of fluorine implantation dose on boron thermal diffusion in silicon

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[1] El Mubarek, H.A.W.
[2] Bonar, J.M.
[3] Dilliway, G.D.
[4] Ashburn, P.
[5] Karunaratne, M.
[6] Willoughby, A.F.
[7] Wang, Y.
[8] Hemment, P.L.F.
[9] Price, R.
[10] Zhang, J.
[11] Ward, P.
来源：
El Mubarek, H.A.W. | 1600年 / American Institute of Physics Inc.卷 / 96期
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The authors would like to acknowledge the Engineering and Physical Sciences Research Council for funding this work;
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