ELECTRON-BEAM TRIMMING OF THIN AND THICK FILM RESISTOR NETWORKS.

被引：0
|
作者：
Schiller, S.
Heisig, U.
Panzer, S.
机构：
来源：
| 1600年 / 18期
关键词：
Compendex;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
INTEGRATED CIRCUIT MANUFACTURE
引用
收藏
相关论文
共 50 条
  • [31] Thin-Film Integrated Resistive Networks.
    Stepien, Boguslaw
    Kaluzniacki, Tomasz
    1978, 19 (09): : 362 - 365
  • [32] THIN ELECTRON-BEAM PROPAGATION IN PLASMAS
    KIM, J
    SEON, J
    MIN, K
    ASTROPHYSICS AND SPACE SCIENCE, 1993, 203 (02) : 181 - 187
  • [33] PENETRATION OF AN ELECTRON-BEAM IN A THIN SOLID FILM - THE INFLUENCE OF BACKSCATTERING FROM THE SUBSTRATE
    DAPOR, M
    PHYSICAL REVIEW B, 1991, 43 (13): : 10118 - 10123
  • [34] CHARACTERISTICS OF Nb THIN FILM MICROBRIDGES FABRICATED BY ELECTRON-BEAM LITHOGRAPHY.
    Shirafuji, Junji
    Matsui, Shoichi
    Hida, Hikaru
    Inuishi, Yoshio
    Technology Reports of the Osaka University, 1980, 30 (1551-1582): : 491 - 495
  • [35] Electron-beam curing of thick thermoset composite matrices
    Glauser, T
    Johansson, M
    Hult, A
    POLYMER, 1999, 40 (19) : 5297 - 5302
  • [36] THIN-FILM RESISTOR NETWORKS IN HYBRID CIRCUITS
    GROTH, L
    SOLID STATE TECHNOLOGY, 1977, 20 (03) : 45 - 49
  • [37] Reliability and robustness of thin film composite resistor networks
    Sachaf, A.
    Klein, I.E.
    Quality and Reliability Engineering International, 1992, 8 (06) : 531 - 536
  • [38] Electromigration behavior of silver thin film fabricated by electron-beam physical vapor deposition
    Zhi Jin
    Yu-An Shen
    Fupeng Huo
    Y. C. Chan
    Hiroshi Nishikawa
    Journal of Materials Science, 2021, 56 : 9769 - 9779
  • [39] Electromigration behavior of silver thin film fabricated by electron-beam physical vapor deposition
    Jin, Zhi
    Shen, Yu-An
    Huo, Fupeng
    Chan, Y. C.
    Nishikawa, Hiroshi
    JOURNAL OF MATERIALS SCIENCE, 2021, 56 (16) : 9769 - 9779
  • [40] Poly-Si thin-film transistors crystallized by electron-beam annealing
    Lin, CY
    Shih, KH
    Wu, CC
    Chin, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (07) : G391 - G393
12345