CHARACTERISTICS OF Nb THIN FILM MICROBRIDGES FABRICATED BY ELECTRON-BEAM LITHOGRAPHY.

被引：0
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作者：
Shirafuji, Junji
Matsui, Shoichi
Hida, Hikaru
Inuishi, Yoshio
机构：
来源：
Technology Reports of the Osaka University | 1980年 / 30卷 / 1551-1582期
关键词：
ELECTRON BEAMS - Applications - ELECTRONIC CIRCUITS; BRIDGE; -; Manufacture; LITHOGRAPHY;
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摘要：
Niobium submicron microbridges (0. 2 multiplied by 0. 2 mu m**2 multiplied by 500 A thick) on Si substrate have been fabricated by electron-beam lithography and lift-off technique. In order to avoid harmful effects of thermal attack and high-energy particle bombardment during Nb rf sputtering on PMMA resist, a new process including lift-off of evaporated Al has been developed. The critical current in the current-voltage characteristics varies linearly with temperature.
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页码：491 / 495
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