Reliability and robustness of thin film composite resistor networks

被引：0
|
作者：
Sachaf, A. [1 ]
Klein, I.E. [1 ]
机构：
[1] Raphael Dep of Microelectronics, Haifa, Israel
来源：
Quality and Reliability Engineering International | 1992年 / 8卷 / 06期
关键词：
Nichrome - Tantalum nitride - Thin film resistors;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：531 / 536
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