Reliability and robustness of thin film composite resistor networks

被引：0

作者：

Sachaf, A. ^{[1
]}

Klein, I.E. ^{[1
]}

机构：

[1] Raphael Dep of Microelectronics, Haifa, Israel

来源：

Quality and Reliability Engineering International | 1992年 / 8卷 / 06期

关键词：

Nichrome - Tantalum nitride - Thin film resistors;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：531 / 536

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