Transient analysis of charge transport in the nitride of MNOS devices under Fowler-Nordheim injection conditions

被引:0
|
作者
Martin, F. [1 ]
Aymerich, X. [1 ]
机构
[1] Universitat Autonoma de Barcelona, Bellaterra, Spain
关键词
Charge transport - Fowler-Nordheim injection conditions - MNOS devices;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:5 / 17
相关论文
共 50 条
  • [41] Coupled charge trapping dynamics in thin SiO2 gate oxide under Fowler-Nordheim stress at low electron fluence
    Samanta, P
    Sarkar, CK
    JOURNAL OF APPLIED PHYSICS, 1998, 83 (05) : 2662 - 2669
  • [42] Highly reliable gate oxide under Fowler-Nordheim electron injection by deuterium pyrogenic oxidation and deuterated poly-Si deposition
    Mitani, Y
    Satake, H
    Itoh, H
    Toriumi, A
    INTERNATIONAL ELECTRON DEVICES MEETING 2000, TECHNICAL DIGEST, 2000, : 343 - 346
  • [43] 70 nm silicon-oxide-nitride-oxide-silicon nonvolatile memory devices using Fowler-Nordheim programming and hot hole erase method
    Chae, S
    Lee, C
    Kim, J
    Sung, SK
    Sim, J
    Kim, M
    Yoon, S
    Jeong, Y
    Ryu, W
    Kim, T
    Park, BG
    Lee, JW
    Kim, C
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (4B): : 2207 - 2210
  • [44] Generation of Single- and Double-Charge Electron Traps in Tunnel Oxide of Flash Memory Cells under Fowler-Nordheim Stress
    Tkachev, Yuri
    Kotov, Alexander
    2011 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP FINAL REPORT (IRW), 2011, : 101 - 104
  • [45] Microscopic Quantum Transport Processes ofOut-of-Plane Charge Flow in 2D Semiconductors Analyzed by a Fowler-Nordheim Tunneling Probe
    Shin, Dong Hoon
    Lee, Duk Hyun
    Choi, Sang-Jun
    Kim, Seonyeong
    Kim, Hakseong
    Watanabe, Kenji
    Taniguchi, Takashi
    Campbell, Eleanor E. B.
    Lee, Sang Wook
    Jung, Suyong
    ADVANCED ELECTRONIC MATERIALS, 2023, 9 (06):
  • [46] Finite-element analysis of corona discharge onset in air with artificial diffusion scheme and under Fowler-Nordheim electron emission
    Lee, Se-Hee
    Lee, Se-Yeon
    Chung, Young-Ki
    Park, Il-Han
    IEEE TRANSACTIONS ON MAGNETICS, 2007, 43 (04) : 1453 - 1456
  • [47] TRANSIENT ANALYSIS OF ELECTRICAL CHARGE INJECTION INTO CHARGE-COUPLED-DEVICES
    CHAMBERLAIN, SG
    WOO, BY
    INTERNATIONAL JOURNAL OF ELECTRONICS, 1976, 40 (06) : 569 - 586
  • [48] Modified Fowler-Nordheim tunnelling for modelling charge injection into Si3N4 in an Al/Si3N4/Si structure
    Li, Gang
    Chen, Xuyuan
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2012, 109 (03): : 539 - 545
  • [49] An unified model to characterize the strong inversion high-frequency capacitance in thin oxide MOS structures under Fowler-Nordheim tunneling injection condition
    Xie, B
    He, YD
    Xu, MZ
    Tan, CH
    1998 5TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY PROCEEDINGS, 1998, : 447 - 449
  • [50] Unified model to characterize the strong inversion high-frequency capacitance in thin oxide MOS structures under Fowler-Nordheim tunneling injection condition
    Xie, Bing
    He, Yandong
    Xu, Mingzhen
    Tan, Changhua
    International Conference on Solid-State and Integrated Circuit Technology Proceedings, 1998, : 447 - 449