Transient analysis of charge transport in the nitride of MNOS devices under Fowler-Nordheim injection conditions

被引:0
|
作者
Martin, F. [1 ]
Aymerich, X. [1 ]
机构
[1] Universitat Autonoma de Barcelona, Bellaterra, Spain
关键词
Charge transport - Fowler-Nordheim injection conditions - MNOS devices;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:5 / 17
相关论文
共 50 条
  • [31] Influence of TCE concentration in thermal oxidation on reliability of SiC MOS capacitors under Fowler-Nordheim electron injection
    Yang, B. L.
    Kwok, Paul C. K.
    Lai, P. T.
    MICROELECTRONICS RELIABILITY, 2006, 46 (12) : 2044 - 2048
  • [32] Dynamics of the Charge Centroid in Metal-Oxide-Nitride-Oxide-Silicon Memory Cells during Avalanche Injection and Fowler-Nordheim Injection Based on Incremental-Step-Pulse Programming
    Fujiki, Jun
    Haimoto, Takashi
    Yasuda, Naoki
    Koyama, Masato
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (04)
  • [33] MOSFET drain current reduction under Fowler-Nordheim and channel hot carrier injection before gate oxide breakdown
    Gerardin, S
    Cester, A
    Paccagnella, A
    Ghidini, G
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2004, 7 (4-6) : 175 - 180
  • [34] Effect of SiN on Performance and Reliability of Charge Trap Flash (CTF) Under Fowler-Nordheim Tunneling Program/Erase Operation
    Sandhya, C.
    Ganguly, Udayan
    Chattar, Nihit
    Olsen, Christopher
    Seutter, Sean M.
    Date, Lucien
    Hung, Raymond
    Vasi, Juzer A.
    Mahapatra, Souvik
    IEEE ELECTRON DEVICE LETTERS, 2009, 30 (02) : 171 - 173
  • [35] TEMPERATURE-DEPENDENT HOLE FLUENCE TO BREAKDOWN IN THIN GATE OXIDES UNDER FOWLER-NORDHEIM ELECTRON-TUNNELING INJECTION
    SATAKE, H
    TORIUMI, A
    APPLIED PHYSICS LETTERS, 1995, 66 (25) : 3516 - 3517
  • [36] Effects of fluorine implants on induced charge components in gate-oxides under constant-current Fowler-Nordheim stress
    Nguyen, TK
    Landsberger, LM
    Jean, C
    Logiudice, V
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1997, 44 (09) : 1432 - 1440
  • [37] Impact of metal work function on memory properties of charge-trap flash memory devices using Fowler-Nordheim PAE mode
    Jeon, Sanghun
    Han, Jeong Hee
    Lee, Junghoon
    Choi, Sangmoo
    Hwang, Hyunsang
    Kim, Chungwoo
    IEEE ELECTRON DEVICE LETTERS, 2006, 27 (06) : 486 - 488
  • [38] Analysis of Fowler-Nordheim injection in NO nitrided gate oxide grown on n-type 4H-SiC
    Li, HF
    Dimitrijev, S
    Sweatman, D
    Harrison, HB
    MICROELECTRONICS RELIABILITY, 2000, 40 (02) : 283 - 286
  • [39] CHARGE TRAPPING AND INTERFACE STATE GENERATION IN METAL-OXIDE-SEMICONDUCTOR CAPACITORS DUE TO FOWLER-NORDHEIM TUNNELING INJECTION AT LOW-TEMPERATURES
    SAKASHITA, M
    ZAIMA, S
    YASUDA, Y
    JOURNAL OF APPLIED PHYSICS, 1990, 67 (11) : 6903 - 6907
  • [40] Interface Trap and Oxide Charge Generation in p-MOSFETs by Direct/Fowler-Nordheim Tunneling Under Negative Bias Temperature Stress
    Choi, Pyungho
    Kim, Dongsoo
    Kim, Sangsub
    Kim, Hyunwoo
    Choi, Byoungdeog
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2016, 16 (10) : 10369 - 10372