Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies

被引：0
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作者：
Özyilmaz, B. [1 ,3 ]
Richter, G. [1 ]
Müsgens, N. [1 ]
Fraune, M. [1 ]
Hawraneck, M. [1 ]
Beschoten, B. [1 ]
Güntherodt, G. [1 ]
Bückins, M. [2 ]
Mayer, J. [2 ]
机构：
[1] Physikalisches Institut IIA, Virtual Institute for Spinelectronics (VlSel), RWTH Aachen University, 52056 Aachen, Germany
[2] Gemeinschaftslabor für Elektronenmikroskopie, RWTH Aachen University, 52056 Aachen, Germany
[3] Department of Physics, Columbia University, New York, NY 10027
来源：
Journal of Applied Physics | 2007年 / 101卷 / 06期
关键词：
Focused-ion-beam milling is used to fabricate nanostencil masks suitable for the fabrication of magnetic nanostructures relevant for spin transfer torque studies. Nanostencil masks are used to define the device dimensions prior to the growth of the thin film stack. They consist of a wet etch resistant top layer and an insulator on top of a prepatterned bottom electrode. The insulator supports a hard mask and gives rise to an undercut by its selective etching. The approach is demonstrated by fabricating current perpendicular to the plane Co/Cu/Co nanopillar junctions; which exhibit current induced magnetization dynamics. © 2007 American Institute of Physics;
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