Erratum: Ferroelectric thin films: Review of materials, properties, and applications (Journal of Applied Physics (2006) 100 (051606))

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作者：
Setter, N.
Damjanovic, D.
Eng, L.
Fox, G.
Gevorgian, S.
Hong, S.
Kingon, A.
Kohlstedt, H.
Park, N.Y.
Stephenson, G.B.
Stolitchnov, I.
Taganstev, A.K.
Taylor, D.V.
Yamada, T.
Streiffer, S.
机构：
[1] Ceramics Laboratory, Swiss Federal Institute of Technology (EPFL), CH-1015 Lausanne, Switzerland
[2] Institute of Applied Physics/Photophysics, University of Technology Dresden, Dresden D-01062, Germany
[3] Ramtron Int. Corp., Colorado Springs, CO 80921, United States
[4] Department of Microtechnology and Nanoscience, Chalmers University of Technology, SE-41296 Gothenburg, Sweden
[5] Microwave and High Speed Electronics Research Center, Ericsson AB, 431 84 Moelndal, Sweden
[6] Nano Devices Laboratory, Samsung Advanced Institute of Technology, Suwon, 440-600, Korea, Republic of
[7] Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7919, United States
[8] Institut für Festkörperforschung (IFF), Forschungszentrum Jülich, 52425 Jülich, Germany
[9] Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, United States
[10] Nanosys Inc., Palo Alto, CA 94304, United States
[11] Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, United States
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Journal of Applied Physics | 1600年 / 100卷 / 10期
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