Molecular dynamics calculation of resist deformation behavior in nanoimprint

被引：0
|
作者：
Li, Shize [1 ]
Wei, Zhengying [1 ]
Du, Jun [1 ]
Tang, Yiping [1 ]
Chu, Huali [1 ]
机构：
[1] State Key Laboratory of Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an,710049, China
来源：
Gaofenzi Cailiao Kexue Yu Gongcheng/Polymeric Materials Science and Engineering | 2015年 / 31卷 / 05期
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页码：105 / 110
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