Molecular dynamics of polymer's interface behaviour in the nanoimprint lithography

被引:0
|
作者
Xiong, Xiaodong [1 ]
Wei, Zhengying [1 ]
Du, Jun [1 ]
Ding, Yucheng [1 ]
机构
[1] State Key Laboratory of Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an 710049, China
关键词
Degree of polymerization - Interaction energies - Interface behaviour - Key factors - Pattern quality - Polydimethylsiloxane PDMS - UV nanoimprint lithography;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:186 / 190
相关论文
共 50 条
  • [1] Molecular dynamics study of pattern transfer in nanoimprint lithography
    Ji-Hoon Kang
    Kwang-Seop Kim
    Kyung-Woong Kim
    Tribology Letters, 2007, 25 : 93 - 102
  • [2] Molecular dynamics study of pattern transfer in nanoimprint lithography
    Kang, Ji-Hoon
    Kim, Kwang-Seop
    Kim, Kyung-Woong
    TRIBOLOGY LETTERS, 2007, 25 (02) : 93 - 102
  • [3] Molecular dynamics study of nanoimprint lithography for glass material
    Tada, K.
    Kimoto, Y.
    Yasuda, M.
    Horimoto, S.
    Kawata, H.
    Hirai, Y.
    MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS, 2007, : 322 - 323
  • [4] Molecular Dynamics Study of Nanoimprint Lithography for Glass Materials
    Tada, Kazuhiro
    Kimoto, Yoshihisa
    Yasuda, Masaaki
    Kawata, Hiroaki
    Hirai, Yoshihiko
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (06) : 06FH131 - 06FH133
  • [5] Confinement and flow dynamics in thin polymer films for nanoimprint lithography
    Teisseire, Jeremie
    Revaux, Amelie
    Foresti, Maud
    Barthel, Etienne
    APPLIED PHYSICS LETTERS, 2011, 98 (01)
  • [6] Polymer science in nanoimprint lithography
    Hirai, Y
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2005, 18 (04) : 551 - 558
  • [7] Atomic step patterning in nanoimprint lithography: Molecular dynamics study
    Tada, Kazuhiro
    Yasuda, Masaaki
    Tan, Geng
    Miyake, Yumiko
    Kawata, Hiroaki
    Yoshimoto, Mamoru
    Hirai, Yoshihiko
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2011, 29 (06):
  • [8] Molecular alignment in submicron patterned polymer matrix using nanoimprint lithography
    Wang, J
    Sun, XY
    Chen, L
    Zhuang, L
    Chou, SY
    APPLIED PHYSICS LETTERS, 2000, 77 (02) : 166 - 168
  • [9] Molecular dynamics investigation of material deformation behavior of PMMA in nanoimprint lithography
    Odujole, Jahlani I.
    Desai, Salil
    AIP ADVANCES, 2020, 10 (09)
  • [10] Molecular dynamics study of yield stress of si Mold for nanoimprint lithography
    Tada, Kazuhiro
    Yasuda, Masaaki
    Kimoto, Yoshihisa
    Kawata, Hiroaki
    Hirai, Yoshihiko
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (04) : 2320 - 2323