Molecular dynamics calculation of resist deformation behavior in nanoimprint

被引：0
|
作者：
Li, Shize [1 ]
Wei, Zhengying [1 ]
Du, Jun [1 ]
Tang, Yiping [1 ]
Chu, Huali [1 ]
机构：
[1] State Key Laboratory of Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an,710049, China
来源：
Gaofenzi Cailiao Kexue Yu Gongcheng/Polymeric Materials Science and Engineering | 2015年 / 31卷 / 05期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：105 / 110
相关论文
共 50 条
  • [41] Studies on nanoimprint process parameters of copper by molecular dynamics analysis
    Hsu, QC
    Wu, CD
    Fang, TH
    COMPUTATIONAL MATERIALS SCIENCE, 2005, 34 (04) : 314 - 322
  • [42] Impact of Resist Shrinkage and Its Correction in Nanoimprint Lithography
    Horiba, Akira
    Yasuda, Masaaki
    Kawata, Hiroaki
    Okada, Makoto
    Matsui, Shinji
    Hirai, Yoshihiko
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (06)
  • [43] Multilayer resist methods for nanoimprint lithography on nonflat surfaces
    Sun, XY
    Zhuang, L
    Zhang, W
    Chou, SY
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3922 - 3925
  • [44] Jet Rollable Nanoimprint Lithography with Piezoelectric Jetting of Resist
    Gehlhausen, David
    Menezes, Shannon
    Chen, Lichuan
    Kim, Gyu-ho
    Lu, Hongbing
    Gao, Jinming
    Hu, Walter
    2013 13TH IEEE CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO), 2013, : 1172 - 1175
  • [45] Mold deformation in nanoimprint lithography
    Lazzarino, F
    Gourgon, C
    Schiavone, P
    Perret, C
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06): : 3318 - 3322
  • [46] A photo-polymerization resist for UV nanoimprint lithography
    Wu, Chun-Chang
    Hsu, Steve Lien-Chung
    Liao, Wen-Chang
    MICROELECTRONIC ENGINEERING, 2009, 86 (03) : 325 - 329
  • [47] Development of hard mask resist materials in nanoimprint lithography
    Takei, Satoshi
    Ogawa, Tsuyoshi
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII, 2011, 7972
  • [48] Analysis of molecular diffusion in resist polymer films simulated by molecular dynamics
    Toriumi, M
    Ohfuji, T
    Endo, M
    Morimoto, H
    MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2, 1999, 3678 : 368 - 379
  • [49] Influence of Vibrational Loading on Deformation Behavior of Metallic Glass: A Molecular Dynamics Study
    Zhang, Mao
    Li, Qiaomin
    Zhang, Jiacheng
    Wang, Xinyun
    Jin, Junsong
    Gong, Pan
    Deng, Lei
    METALS, 2019, 9 (11)
  • [50] Molecular dynamics simulation of the behavior of titanium under high-speed deformation
    Nelasov, I., V
    Kartamyshev, A., I
    Boev, A. O.
    Lipnitskii, A. G.
    Kolobov, Yu R.
    Nguyen, Truong Khang
    MODELLING AND SIMULATION IN MATERIALS SCIENCE AND ENGINEERING, 2021, 29 (06)
12345