A positive tone photosensitive polyimide for use on a broadband stepper

被引：0
|
作者：
机构：
[1] Flack, W.W.
[2] Kulas, S.
[3] Franklin, C.L.
[4] Schuckert, C.C.
来源：
Schuckert, C.C. (craig.c.schuckert@usa.dupont.com) | 2001年 / PennWell Publishing Co.卷 / 10期
关键词：
Characterization - Curing - Lithography - Passivation - Photoresists - Photosensitivity - Scanning electron microscopy - Semiconductor device manufacture - Semiconductor device structures;
D O I：
暂无
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学科分类号：
摘要：
New positive tone, aqueous processing, photodefinable polyimides form passivation stress-buffers with higher resolution, yield, and manufacturing capacity than earlier types. Using photoresist characterization methods, process windows for different polyimide thicknesses and stepper exposure spectra are established.
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