Scaling limit of silicon nitride gate dielectric for future CMOS technologies

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[1] Yeo, Yee Chia
[2] Lu, Qiang
[3] Lee, Wen-Chin
[4] King, Tsu-Jae
[5] Hu, Chenming
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Yeo, Yee Chia | 2000年 / IEEE, Piscataway, NJ, United States卷
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