Effect of the monomer TEOS flow rate on the formation of silicon dioxide films by nonequilibrium, atmospheric pressure plasma jet

被引：0
|
作者：
Lin, Jiang [1 ]
Zhang, Xi-Wen [1 ,2 ]
Han, Gao-Rong [1 ,2 ]
机构：
[1] Institute of Inorganic and Nonmetallic Materials, Zhejiang University, Hangzhou 310027, China
[2] Silicon State Key Laboratory, Zhejiang University, Hangzhou 310027, China
来源：
Gongneng Cailiao/Journal of Functional Materials | 2011年 / 42卷 / SUPPL. 2期
关键词：
17;
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页码：302 / 305
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