High-rate deposition of amorphous silicon films by atmospheric pressure plasma CVD

被引：0
|
作者：
机构：
[1] Mori, Yuzo
[2] Yoshii, Kumayasu
[3] 1,Yasutake, Kiyoshi
[4] Kakiuchi, Hiroaki
来源：
Mori, Yuzo | 2000年 / Osaka Univ, Osaka, Japan卷 / 50期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Extremely high-rate deposition of silicon thin films prepared by atmospheric plasma CVD method with a rotary electrode
    Matsumoto, M
    Shima, M
    Okamoto, S
    Murata, K
    Tanaka, M
    Kiyama, S
    Kakiuchi, H
    Yasutake, K
    Yoshii, K
    Endo, K
    Mori, Y
    PROCEEDINGS OF 3RD WORLD CONFERENCE ON PHOTOVOLTAIC ENERGY CONVERSION, VOLS A-C, 2003, : 1552 - 1555
  • [2] High-rate deposition of hydrogenated amorphous silicon films and devices
    Luft, Werner
    Applied physics communications, 1988, 8 (04): : 239 - 298
  • [3] High-Rate Deposition of Amorphous Silicon
    Budagyan B.G.
    Sherchenkov A.A.
    Berdnikov A.E.
    Chernomordik V.D.
    Russian Microelectronics, 2000, 29 (6) : 391 - 396
  • [4] High-rate deposition of intrinsic amorphous silicon layers for solar cells using very high frequency plasma at atmospheric pressure
    Kakiuchi, H
    Ohmi, H
    Kuwahara, Y
    Matsumoto, M
    Ebata, Y
    Yasutake, K
    Yoshii, K
    Mori, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (4B): : 3587 - 3591
  • [5] INVESTIGATIONS ON HYDROGENATED AMORPHOUS-SILICON FILMS GROWN AT HIGH-RATE IN A UHV PLASMA CVD SYSTEM
    DIXIT, PN
    PANWAR, OS
    SATYANARAYAN, BS
    BHATTACHARYYA, R
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1995, 37 (02) : 143 - 157
  • [6] High-Rate Deposition of Amorphous Silicon Films by Microwave-Excited High-Density Plasma
    Inoue, Hirotada
    Tanaka, Kouji
    Sano, Yuichi
    Nishimura, Takehiro
    Teramoto, Akinobu
    Hirayama, Masaki
    Ohmi, Tadahiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (03)
  • [7] High-rate deposition of hydrogenated amorphous silicon films using inductively coupled silane plasma
    Sakikawa, N
    Shishida, Y
    Miyazaki, S
    Hirose, M
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2001, 66 (1-4) : 337 - 343
  • [8] Investigation of deposition characteristics and properties of high-rate deposited silicon nitride films prepared by atmospheric pressure plasma chemical vapor deposition
    Kakiuchi, H
    Nakahama, Y
    Ohmi, H
    Yasutake, K
    Yoshii, K
    Mori, Y
    THIN SOLID FILMS, 2005, 479 (1-2) : 17 - 23
  • [9] High-rate deposition of amorphous silicon films using hot-wire CVD with a coil-shaped filament
    Povolny, HS
    Deng, XM
    THIN SOLID FILMS, 2003, 430 (1-2) : 125 - 129
  • [10] High-rate deposition of LiNbO3 films by thermal plasma spray CVD
    Yamaguchi, N
    Hattori, T
    Terashima, K
    Yoshida, T
    THIN SOLID FILMS, 1998, 316 (1-2) : 185 - 188
12345