High-rate deposition of amorphous silicon films by atmospheric pressure plasma CVD

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[1] Mori, Yuzo
[2] Yoshii, Kumayasu
[3] 1,Yasutake, Kiyoshi
[4] Kakiuchi, Hiroaki
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Mori, Yuzo | 2000年 / Osaka Univ, Osaka, Japan卷 / 50期
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