Effect of the monomer TEOS flow rate on the formation of silicon dioxide films by nonequilibrium, atmospheric pressure plasma jet

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作者
Lin, Jiang [1 ]
Zhang, Xi-Wen [1 ,2 ]
Han, Gao-Rong [1 ,2 ]
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[1] Institute of Inorganic and Nonmetallic Materials, Zhejiang University, Hangzhou 310027, China
[2] Silicon State Key Laboratory, Zhejiang University, Hangzhou 310027, China
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页码:302 / 305
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