Effect of N2 flow rate on the properties of N doped TiO2 films deposited by DC coupled RF magnetron sputtering

被引：0
|
作者：
Peng, Shou [1 ,2 ]
Yang, Yong [2 ]
Li, Gang [2 ]
Jiang, Jiwen [2 ]
Jin, Kewu [2 ]
Yao, TingTing [2 ]
Zhang, Kuanxiang [2 ]
Cao, Xin [2 ,3 ]
Wang, Yun [2 ]
Xu, Genbao [2 ]
机构：
[1] State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan,430000, China
[2] State Key Laboratory of Advanced Technology for Float Glass, Bengbu Design and Research Institute for Glass Industry, Bengbu,233000, China
[3] School of Materials Science and Engineering, Dalian Jiaotong University, Dalian,116000, China
来源：
Journal of Alloys and Compounds | 2016年 / 678卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：355 / 359
相关论文
共 50 条
  • [31] Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering
    Zhang Can
    Ding Wanyu
    Wang Hualin
    Chai Weiping
    Ju Dongying
    JOURNAL OF ENVIRONMENTAL SCIENCES, 2009, 21 (06) : 741 - 744
  • [32] Influences of working pressure on properties for TiO2 films deposited by DC pulse magnetron sputtering
    ZHANG Can1
    Journal of Environmental Sciences, 2009, (06) : 741 - 744
  • [33] Incorporation of N in TiO2 films grown by DC-reactive magnetron sputtering
    Serio, S.
    Melo Jorge, M. E.
    Nunes, Y.
    Barradas, N. P.
    Alves, E.
    Munnik, F.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2012, 273 : 109 - 112
  • [34] The effect of N2 partial pressure on the properties of Nb-Si-N films by RF reactive magnetron sputtering
    Song, Z. X.
    Wang, Y.
    Wang, C. J. F.
    Liu, C. L.
    Xu, K. W.
    SURFACE & COATINGS TECHNOLOGY, 2007, 201 (9-11): : 5412 - 5415
  • [35] Photocatalytic property of TiO2 films deposited by pulsed DC magnetron sputtering
    Zhang, WJ
    Zhu, SL
    Li, Y
    Wang, FH
    JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 2004, 20 (01) : 31 - 34
  • [36] Effect of N2 flow rate on the microstructure and electrochemical behavior of TaNx films deposited by modulated pulsed power magnetron sputtering
    Mendizabal, L.
    Bayon, R.
    G-Berasategui, E.
    Barriga, J.
    Gonzalez, J. J.
    THIN SOLID FILMS, 2016, 610 : 1 - 9
  • [37] Photocatalytic Property of TiO2 Films Deposited by Pulsed DC Magnetron Sputtering
    Wenjie ZHANG
    Journal of Materials Science & Technology, 2004, (01) : 31 - 34
  • [38] Optical characterization of BCN films deposited at various N2/Ar gas flow ratios by RF magnetron sputtering
    Todi, Vinit O.
    Shantheyanda, Bojanna P.
    Todi, Ravi M.
    Sundaram, Kalpathy B.
    Coffey, Kevin
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2011, 176 (12): : 878 - 882
  • [39] Luminescence behavior and compensation effect of N-doped ZnO films deposited by rf magnetron sputtering under various gas-flow ratios of O2/N2
    Cho, Wei-Min
    Lin, Yow-Jon
    Liu, Chia-Jyi
    Chen, Liang-Ru
    Shih, Yu-Tai
    Chen, Perry
    JOURNAL OF LUMINESCENCE, 2014, 145 : 884 - 887
  • [40] Soft magnetic properties of as-deposited Fe-Hf-C-N films by N2 reactive RF magnetron sputtering
    Seoul Natl Univ, Seoul, Korea, Republic of
    J Phy IV JP, 2 (363-366):
12345