Effect of N2 flow rate on the properties of N doped TiO2 films deposited by DC coupled RF magnetron sputtering

被引：0
|
作者：
Peng, Shou [1 ,2 ]
Yang, Yong [2 ]
Li, Gang [2 ]
Jiang, Jiwen [2 ]
Jin, Kewu [2 ]
Yao, TingTing [2 ]
Zhang, Kuanxiang [2 ]
Cao, Xin [2 ,3 ]
Wang, Yun [2 ]
Xu, Genbao [2 ]
机构：
[1] State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, Wuhan,430000, China
[2] State Key Laboratory of Advanced Technology for Float Glass, Bengbu Design and Research Institute for Glass Industry, Bengbu,233000, China
[3] School of Materials Science and Engineering, Dalian Jiaotong University, Dalian,116000, China
来源：
Journal of Alloys and Compounds | 2016年 / 678卷
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页码：355 / 359
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