Optical characterization of BCN films deposited at various N2/Ar gas flow ratios by RF magnetron sputtering

被引：13
|
作者：
Todi, Vinit O. [1 ]
Shantheyanda, Bojanna P. [1 ]
Todi, Ravi M. [1 ]
Sundaram, Kalpathy B. [1 ]
Coffey, Kevin [2 ]
机构：
[1] Univ Cent Florida, Dept Elect Engn & Comp Sci, Orlando, FL 32816 USA
[2] Univ Cent Florida, Adv Mat Proc & Anal Ctr, Orlando, FL 32816 USA
来源：
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS | 2011年 / 176卷 / 12期
关键词：
Sputtering; BCN; Optical properties; Band gap; CHEMICAL-VAPOR-DEPOSITION; SICBN THIN-FILMS; TRIBOLOGICAL PROPERTIES; DIELECTRIC-CONSTANT; MULTILAYER FILMS; BORON-NITRIDE; COATINGS; GROWTH;
D O I：
10.1016/j.mseb.2011.05.010
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We present the deposition and optical characterization of amorphous thin films of boron carbonitride (BCN). The BCN thin films were deposited in a radio frequency magnetron sputtering system using a B4C target. Films of different compositions were deposited by varying the ratio of argon and nitrogen gas in the sputtering ambient. X-ray photoelectron spectroscopy was used to perform surface characterization of the deposited films and a change in composition with nitrogen flow ratio was observed. The effect of gas flow ratios on the optical properties of the films was also investigated. It was found that the transmittance of the films increases with nitrogen incorporation. The optical band gap of the films ranged from 2.0 eV to 3.1 eV and increased with N-2/Ar gas flow ratio except at the highest ratio. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码：878 / 882
页数：5
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