SUBSTRATE EFFECT ON THE ELECTRICAL-PROPERTIES OF A-SI-H THIN-FILMS AND ITS MODIFICATION BY DIFFUSION-BLOCKING INTERLAYERS

被引：1

作者：

BREGMAN, J

GORDON, J

SHAPIRA, Y

FORTUNATO, E

MARTINS, R

GUIMARAES, L

机构：

[1] UNIV NOVA LISBOA,FAC CIENCIAS & TECNOL,P-1200 LISBON,PORTUGAL

[2] UNIV LISBON,INST NACL INVEST CIENT,CTR FIS MOLEC,LISBON,PORTUGAL

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 04期

关键词：

D O I：

10.1116/1.575808

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2628 / 2631

页数：4

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