SUBSTRATE EFFECT ON THE ELECTRICAL-PROPERTIES OF A-SI-H THIN-FILMS AND ITS MODIFICATION BY DIFFUSION-BLOCKING INTERLAYERS

被引：1
|
作者：
BREGMAN, J
GORDON, J
SHAPIRA, Y
FORTUNATO, E
MARTINS, R
GUIMARAES, L
机构：
[1] UNIV NOVA LISBOA,FAC CIENCIAS & TECNOL,P-1200 LISBON,PORTUGAL
[2] UNIV LISBON,INST NACL INVEST CIENT,CTR FIS MOLEC,LISBON,PORTUGAL
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 04期
关键词：
D O I：
10.1116/1.575808
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2628 / 2631
页数：4
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