MASS BALANCE OF THE REACTIVE ION ETCHING PRODUCTS OF SILICON ON SIO2

被引：0
|
作者：
MAUER, JL [1 ]
SCHWARTZ, GC [1 ]
机构：
[1] IBM CORP, E FISHKILL FACIL, DIV DATA SYST, HOPEWELL JUNCTION, NY 12533 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C88 / C88
页数：1
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