首页
学术期刊
论文检测
AIGC检测
热点
更多
数据
SILICON MOLECULAR-BEAM EPITAXY - STATUS - DEVICES - TRENDS
被引:0
|
作者
:
KASPER, E
论文数:
0
引用数:
0
h-index:
0
KASPER, E
机构
:
来源
:
JOURNAL DE PHYSIQUE
|
1988年
/ 49卷
/ C-4期
关键词
:
D O I
:
10.1051/jphyscol:1988473
中图分类号
:
学科分类号
:
摘要
:
引用
收藏
页码:347 / 355
页数:9
相关论文
共 50 条
[41]
MODELING OF SILICON MOLECULAR-BEAM EPITAXY ON SI(100)
OSTEN, HJ
论文数:
0
引用数:
0
h-index:
0
机构:
MBE Laboratory, the Institute of Semiconductor Physics, W.-Korsing-Str. 2
OSTEN, HJ
THIN SOLID FILMS,
1992,
215
(01)
: 14
-
18
[42]
SILICON AUTOCOMPENSATION IN GAAS GROWN BY MOLECULAR-BEAM EPITAXY
BALLINGALL, JM
论文数:
0
引用数:
0
h-index:
0
机构:
WASHINGTON UNIV,DEPT ELECT ENGN,ST LOUIS,MO 63130
WASHINGTON UNIV,DEPT ELECT ENGN,ST LOUIS,MO 63130
BALLINGALL, JM
MORRIS, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
WASHINGTON UNIV,DEPT ELECT ENGN,ST LOUIS,MO 63130
WASHINGTON UNIV,DEPT ELECT ENGN,ST LOUIS,MO 63130
MORRIS, BJ
LEOPOLD, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
WASHINGTON UNIV,DEPT ELECT ENGN,ST LOUIS,MO 63130
WASHINGTON UNIV,DEPT ELECT ENGN,ST LOUIS,MO 63130
LEOPOLD, DJ
RODE, DL
论文数:
0
引用数:
0
h-index:
0
机构:
WASHINGTON UNIV,DEPT ELECT ENGN,ST LOUIS,MO 63130
WASHINGTON UNIV,DEPT ELECT ENGN,ST LOUIS,MO 63130
RODE, DL
JOURNAL OF APPLIED PHYSICS,
1986,
59
(10)
: 3571
-
3573
[43]
SILICON DOPING IN INP GROWN BY MOLECULAR-BEAM EPITAXY
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
KAWAMURA, Y
ASAHI, H
论文数:
0
引用数:
0
h-index:
0
ASAHI, H
APPLIED PHYSICS LETTERS,
1983,
43
(08)
: 780
-
782
[44]
SILICON MOLECULAR-BEAM EPITAXY WITH ANTIMONY ION DOPING
SUGIURA, H
论文数:
0
引用数:
0
h-index:
0
SUGIURA, H
JOURNAL OF APPLIED PHYSICS,
1980,
51
(05)
: 2630
-
2633
[45]
EFFUSION CELLS FOR DOPING IN SILICON MOLECULAR-BEAM EPITAXY
CASEL, A
论文数:
0
引用数:
0
h-index:
0
CASEL, A
KASPER, E
论文数:
0
引用数:
0
h-index:
0
KASPER, E
KIBBEL, H
论文数:
0
引用数:
0
h-index:
0
KIBBEL, H
VAKUUM-TECHNIK,
1985,
34
(08):
: 231
-
235
[46]
HETEROEPITAXIAL GROWTH OF GAP ON SILICON BY MOLECULAR-BEAM EPITAXY
GONDA, SI
论文数:
0
引用数:
0
h-index:
0
GONDA, SI
MATSUSHIMA, Y
论文数:
0
引用数:
0
h-index:
0
MATSUSHIMA, Y
MUKAI, S
论文数:
0
引用数:
0
h-index:
0
MUKAI, S
MAKITA, Y
论文数:
0
引用数:
0
h-index:
0
MAKITA, Y
IGARASHI, O
论文数:
0
引用数:
0
h-index:
0
IGARASHI, O
JAPANESE JOURNAL OF APPLIED PHYSICS,
1978,
17
(06)
: 1043
-
1048
[47]
SILICON MOLECULAR-BEAM EPITAXY - 1984-1986
BEAN, JC
论文数:
0
引用数:
0
h-index:
0
BEAN, JC
JOURNAL OF CRYSTAL GROWTH,
1987,
81
(1-4)
: 411
-
420
[48]
SILICON LAYERS GROWN BY DIFFERENTIAL MOLECULAR-BEAM EPITAXY
HERZOG, HJ
论文数:
0
引用数:
0
h-index:
0
机构:
AEG-Telefunken Forschungsinstitut, Ulm, West Ger, AEG-Telefunken Forschungsinstitut, Ulm, West Ger
HERZOG, HJ
KASPER, E
论文数:
0
引用数:
0
h-index:
0
机构:
AEG-Telefunken Forschungsinstitut, Ulm, West Ger, AEG-Telefunken Forschungsinstitut, Ulm, West Ger
KASPER, E
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1985,
132
(09)
: 2227
-
2231
[49]
SILICON MOLECULAR-BEAM EPITAXY - HIGHLIGHTS OF RECENT WORK
BEAN, JC
论文数:
0
引用数:
0
h-index:
0
机构:
ATT Bell Laboratories, Murray Hill, 07974, New Jersey
BEAN, JC
JOURNAL OF ELECTRONIC MATERIALS,
1990,
19
(10)
: 1055
-
1059
[50]
Properties of Silicon Layers Grown by Molecular-Beam Epitaxy
V. G. Shengurov
论文数:
0
引用数:
0
h-index:
0
机构:
Lobachevski State University,Research Physicotechnical Institute
V. G. Shengurov
S. P. Svetlov
论文数:
0
引用数:
0
h-index:
0
机构:
Lobachevski State University,Research Physicotechnical Institute
S. P. Svetlov
V. Yu. Chalkov
论文数:
0
引用数:
0
h-index:
0
机构:
Lobachevski State University,Research Physicotechnical Institute
V. Yu. Chalkov
G. N. Gorshenin
论文数:
0
引用数:
0
h-index:
0
机构:
Lobachevski State University,Research Physicotechnical Institute
G. N. Gorshenin
D. V. Shengurov
论文数:
0
引用数:
0
h-index:
0
机构:
Lobachevski State University,Research Physicotechnical Institute
D. V. Shengurov
S. A. Denisov
论文数:
0
引用数:
0
h-index:
0
机构:
Lobachevski State University,Research Physicotechnical Institute
S. A. Denisov
Inorganic Materials,
2005,
41
: 1131
-
1134
←
1
2
3
4
5
→