INTERFACIAL PROPERTIES OF METAL-SILICON OXIDE-METAL STRUCTURES IN RELATION TO THE NONSTOICHIOMETRY OF A THIN-FILM DIELECTRIC

被引：3
|
作者：
PISARKIEWICZ, T
机构：
来源：
THIN SOLID FILMS | 1980年 / 67卷 / 01期
关键词：
D O I：
10.1016/0040-6090(80)90286-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：49 / 55
页数：7
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