INTERFACIAL PROPERTIES OF METAL-SILICON OXIDE-METAL STRUCTURES IN RELATION TO THE NONSTOICHIOMETRY OF A THIN-FILM DIELECTRIC

被引:3
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PISARKIEWICZ, T
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10.1016/0040-6090(80)90286-2
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T [工业技术];
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08 ;
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页码:49 / 55
页数:7
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