THE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIC, TIN AND TICXN1-X

被引：98
|
作者：
ARCHER, NJ [1 ]
机构：
[1] FULMER RES INST,STOKE POGES SL2 4QD,BUCKINGHAMSHIRE,ENGLAND
来源：
THIN SOLID FILMS | 1981年 / 80卷 / 1-3期
关键词：
D O I：
10.1016/0040-6090(81)90225-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：221 / 225
页数：5
相关论文
共 50 条
  • [41] CORROSION BEHAVIOR OF TIN FILMS OBTAINED BY PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION
    IN, CB
    KIM, SP
    CHUN, JS
    JOURNAL OF MATERIALS SCIENCE, 1994, 29 (07) : 1818 - 1824
  • [42] THE DEPOSITION OF TIN COATINGS BY PLASMA CHEMICAL VAPOR-DEPOSITION AND ITS APPLICATION
    LI, S
    ZHAO, C
    SHI, Y
    XU, X
    HUANG, W
    XIE, W
    YANG, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C483 - C483
  • [43] Chemical reactions in plasma-assisted chemical vapor deposition of titanium
    NEC Corp, Ibaraki, Japan
    J Electrochem Soc, 7 (2558-2562):
  • [44] Chemical reactions in plasma-assisted chemical vapor deposition of titanium
    Ohshita, Y
    Watanabe, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (07) : 2558 - 2562
  • [45] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF DIAMOND BY HOLLOW-CATHODE ARC-DISCHARGE
    STIEGLER, J
    ROTH, S
    HAMMER, K
    SCHARFF, W
    THIN SOLID FILMS, 1992, 219 (1-2) : 4 - 6
  • [46] GRAZING-INCIDENCE REFLECTANCE OF SIC FILMS PRODUCED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
    KESKIKUHA, RAM
    OSANTOWSKI, JF
    TOFT, AR
    PARTLOW, WD
    APPLIED OPTICS, 1988, 27 (08): : 1499 - 1502
  • [47] MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITION OF DIAMOND
    VANDENBULCKE, L
    BOU, P
    HERBIN, R
    CHOLET, V
    BENY, C
    JOURNAL DE PHYSIQUE, 1989, 50 (C-5): : 177 - 188
  • [48] BLUE AND GREEN CATHODOLUMINESCENCE OF SYNTHESIZED DIAMOND FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
    KAWARADA, H
    NISHIMURA, K
    ITO, T
    SUZUKI, J
    MAR, KS
    YOKOTA, Y
    HIRAKI, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (04): : L683 - L686
  • [49] PRESSURE SENSOR USING POLYCRYSTALLINE GERMANIUM FILMS PREPARED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
    KAMIMURA, K
    KIMURA, N
    ONUMA, Y
    SENSORS AND ACTUATORS A-PHYSICAL, 1990, 23 (1-3) : 958 - 960
  • [50] ENHANCED GROWTH OF DEVICE-QUALITY COPPER BY HYDROGEN PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
    EISENBRAUN, ET
    ZHENG, B
    DUNDON, CP
    DING, PJ
    KALOYEROS, AE
    APPLIED PHYSICS LETTERS, 1992, 60 (25) : 3126 - 3128
12345