Chemical reactions in plasma-assisted chemical vapor deposition of titanium

被引：0

|

作者：

NEC Corp, Ibaraki, Japan ^{[1
]}

机构：

来源：

J Electrochem Soc | / 7卷 / 2558-2562期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

收藏

相关论文

共 50 条

[1] Chemical reactions in plasma-assisted chemical vapor deposition of titanium
Ohshita, Y
Watanabe, K
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (07) : 2558 - 2562
[2] Chemical reactions determining the step-coverage quality in plasma-assisted chemical vapor deposition of titanium
Ohshita, Y
Watanabe, K
JOURNAL OF CRYSTAL GROWTH, 1999, 203 (04) : 540 - 546
[3] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION WITH TITANIUM AMIDES AS PRECURSORS
STOCK, HR
BERNDT, H
MAYR, P
SURFACE & COATINGS TECHNOLOGY, 1991, 46 (01): : 15 - 23
[4] TITANIUM NITRIDE DEPOSITED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
LAIMER, J
STORI, H
RODHAMMER, P
THIN SOLID FILMS, 1990, 191 (01) : 77 - 89
[5] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF BORON
VANDENBULCKE, L
HERBIN, R
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (03) : C94 - C94
[6] PLASMA-INDUCED AND PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
VEPREK, S
THIN SOLID FILMS, 1985, 130 (1-2) : 135 - 154
[7] Microwave plasma-assisted chemical vapor deposition for growing diamondss
Bénédic, F
Bougdira, J
VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 2001, 56 (300): : 307 - +
[8] PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF CRYSTALLINE SILICON
DONAHUE, TJ
REIF, R
BURGER, WR
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (03) : C105 - C105
[9] TiSi2/Si interface instability in plasma-assisted chemical vapor deposition of titanium
Ohshita, Y
Oshida, M
Seki, M
Watanabe, K
JOURNAL OF CRYSTAL GROWTH, 1998, 193 (03) : 322 - 327
[10] THE INFLUENCE OF TITANIUM INTERLAYERS ON THE ADHESION OF TITANIUM NITRIDE COATINGS OBTAINED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
BULL, SJ
CHALKER, PR
AYRES, CF
RICKERBY, DS
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 : 71 - 78

← 1 2 3 4 5 →