THE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIC, TIN AND TICXN1-X

被引：98
|
作者：
ARCHER, NJ [1 ]
机构：
[1] FULMER RES INST,STOKE POGES SL2 4QD,BUCKINGHAMSHIRE,ENGLAND
来源：
THIN SOLID FILMS | 1981年 / 80卷 / 1-3期
关键词：
D O I：
10.1016/0040-6090(81)90225-X
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：221 / 225
页数：5
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