FABRICATION OF MICROELECTRONICS RETICLES

被引:0
|
作者
SHOHO, RM
机构
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:75 / 79
页数:5
相关论文
共 50 条
  • [41] MICROLITHOGRAPHY - MASKS AND RETICLES
    TOBEY, AC
    SOLID STATE TECHNOLOGY, 1978, 21 (05) : 49 - 49
  • [42] Wafer-Scale Multilayer Fabrication for Silk Fibroin-Based Microelectronics
    Kook, Geon
    Jeong, Sohyeon
    Kim, So Hyun
    Kim, Mi Kyung
    Lee, Sungwoo
    Cho, Il-Joo
    Choi, Nakwon
    Lee, Hyunjoo J.
    ACS APPLIED MATERIALS & INTERFACES, 2019, 11 (01) : 115 - 124
  • [43] UV inspection of EUV and SCALPEL reticles
    Pettibone, DW
    Bareket, N
    Liang, T
    Stivers, AR
    Hector, SD
    Mangat, PJS
    Resnick, DJ
    Lercel, M
    Lawliss, M
    Magg, C
    Novembre, A
    Farrow, R
    20TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, 2000, 4186 : 241 - 249
  • [44] Particle Cleaning of EUV Reticles
    Scaccabarozzi, Luigi
    Lammers, Niels A.
    Moors, Roel
    Banine, Vadim
    JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 2009, 23 (12) : 1603 - 1622
  • [45] Laser via ablation technology for MCM-D fabrication at IBM microelectronics
    Patel, R.S.
    Redmond, T.F.
    Tessler, C.
    Tudryn, D.
    Pulaski, D.
    International Journal of Microcircuits and Electronic Packaging, 1995, 18 (03): : 266 - 274
  • [46] Fabrication and Characteristics of Al2O3 Layers for Microelectronics.
    Leimbrock, Wolfgang
    Guenther, Stefan
    Wissenschaftliche Zeitschrift - Technische Hochschule Karl-Marx-Stadt, 1979, 21 (07): : 835 - 846
  • [47] Control of surface energy to optimize post CMP cleaning efficiency for microelectronics fabrication
    Ozbek, Sebnem
    Walker, Travis W.
    Basim, G. Bahar
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2017, 253
  • [48] Shipping, handling and storage of reticles
    Zhu, SB
    Martin, R
    PHOTOMASK AND X-RAY MASK TECHNOLOGY VI, 1999, 3748 : 446 - 453
  • [49] NEW TRENDS IN MICROELECTRONICS FABRICATION TECHNOLOGY 1965-1966 .I.
    THORNTON, CG
    SEMICONDUCTOR PRODUCTS AND SOLID STATE TECHNOLOGY, 1966, 9 (03): : 42 - &
  • [50] AUTOMATIC INSPECTION OF CONTAMINANTS ON RETICLES
    SHIBA, M
    KOIZUMI, M
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 470 : 233 - 239