EVIDENCE FOR PYROELECTRICITY IN AL-SIO2-SI STRUCTURES

被引：0
|
作者：
THURZO, I [1 ]
机构：
[1] SLOVAK ACAD SCI,INST PHYS,CS-89930 BRATISLAVA,CZECHOSLOVAKIA
来源：
ACTA PHYSICA SLOVACA | 1980年 / 30卷 / 02期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：179 / 182
页数：4
相关论文
共 50 条
  • [31] POSITIVE CHARGE EFFECTS ON THE FLAT-BAND VOLTAGE SHIFT DURING AVALANCHE INJECTION ON AL-SIO2-SI CAPACITORS
    FISCHETTI, MV
    GASTALDI, R
    MAGGIONI, F
    MODELLI, A
    JOURNAL OF APPLIED PHYSICS, 1982, 53 (04) : 3129 - 3135
  • [32] Large magnetoresistance in Si:B-SiO2-Al structures
    Schoonus, J. J. H. M.
    Kohlhepp, J. T.
    Swagten, H. J. M.
    Koopmans, B.
    JOURNAL OF APPLIED PHYSICS, 2008, 103 (07)
  • [33] Electrical behaviour of Al/SiO2/Si structures with SiC nanocrystals
    Horváth, ZJ
    Dózsa, L
    Krafcsik, OH
    Mohácsy, T
    Vida, G
    APPLIED SURFACE SCIENCE, 2004, 234 (1-4) : 67 - 71
  • [34] Interfacial reactions in the SiO2/Ru and SiO2/Ru/Al-Si structures
    Wang, Shi-Qing
    Hong, Stella
    White, Allen
    Hoener, Carolyn
    Mayer, J.W.
    Journal of Applied Physics, 1995, 77 (11):
  • [35] Study of the photoresponse of ITO/SiO2/Si/SiO2/Al MIS capacitor structures
    G-Martinez, J. Miguel
    Gonzalez-Flores, K. E.
    Marquez, Braulio P.
    Moreno-Moreno, Mario
    Morales Sanchez, Alfredo
    2022 IEEE LATIN AMERICAN ELECTRON DEVICES CONFERENCE (LAEDC), 2022,
  • [36] INTERFACIAL REACTIONS IN THE SIO2/RU AND SIO2/RU/AL-SI STRUCTURES
    WANG, SQ
    HONG, S
    WHITE, A
    HOENER, C
    MAYER, JW
    JOURNAL OF APPLIED PHYSICS, 1995, 77 (11) : 5751 - 5762
  • [37] STUDY OF INJECTION AND CONDUCTION IMPULSE IN SI-SIO2-AL STRUCTURES
    BONNET, J
    LASSABATERE, L
    THIN SOLID FILMS, 1974, 22 (02) : 177 - 187
  • [38] Residual stresses in the elastoplastic multilayer thin film structures:: The cases of Si/Al bilayer and Si/Al/SiO2 trilayer structures
    Zhang, X. C.
    Xu, B. S.
    Xuan, F. Z.
    JOURNAL OF APPLIED PHYSICS, 2008, 103 (07)
  • [39] Residual stresses in the elastoplastic multilayer thin film structures: The cases of Si/Al bilayer and Si/Al/ SiO2 trilayer structures
    Zhang, X.C.
    Xu, B.S.
    Xuan, F.Z.
    Journal of Applied Physics, 2008, 103 (07):
  • [40] CHARGE STORAGE PHENOMENA IN AL-GAMMA-AL2O3-SIO2-SI STRUCTURES
    CHOU, NJ
    TSANG, PJ
    METALLURGICAL TRANSACTIONS, 1971, 2 (03): : 659 - &
12345