Residual stresses in the elastoplastic multilayer thin film structures: The cases of Si/Al bilayer and Si/Al/ SiO2 trilayer structures

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作者：
Zhang, X.C. [1 ,2 ]
Xu, B.S. [3 ]
Xuan, F.Z. [2 ]
机构：
[1] Shanghai Key Laboratory of Laser Materials Processing and Modification, Shanghai Jiaotong University, Shanghai, 200030, China
[2] School of Mechanical Engineering, East China University of Science and Technology, Shanghai, 200237, China
[3] National Key Laboratory for Remanufacturing, Beijing 100072, China
来源：
Journal of Applied Physics | 2008年 / 103卷 / 07期
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