THERMAL OXIDATION OF SPUTTERED TANTALUM THIN FILMS BETWEEN 100 DEGREES C AND 525 DEGREES C

被引：54

作者：

STEIDEL, CA

GERSTENBERG, D

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1969年 / 40卷 / 09期

关键词：

D O I：

10.1063/1.1658279

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3828 / +

页数：1

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