PHOTOGRAPHIC PROCESS BASED ON OXIDATION-REDUCTION REACTIONS ON SURFACE OF SILICON

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作者：

GORYACHEV, DN

PARITSKI.LG

RYVKIN, SM

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SOVIET PHYSICS SEMICONDUCTORS-USSR | 1971年 / 4卷 / 08期

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O469 [凝聚态物理学];

学科分类号：

070205 ;

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页码：1356 / +

页数：1

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