PHOTOGRAPHIC PROCESS BASED ON OXIDATION-REDUCTION REACTIONS ON SURFACE OF SILICON

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作者：
GORYACHEV, DN
PARITSKI.LG
RYVKIN, SM
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SOVIET PHYSICS SEMICONDUCTORS-USSR | 1971年 / 4卷 / 08期
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O469 [凝聚态物理学];
学科分类号：
070205 ;
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页码：1356 / +
页数：1
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