HIGH-RATE MAGNETRON SPUTTERING OF HIGH TC NB3SN FILMS

被引：49
|
作者：
WU, CT [1 ]
KAMPWIRTH, RT [1 ]
HAFSTROM, JW [1 ]
机构：
[1] ARGONNE NATL LAB,ARGONNE,IL 60439
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期
关键词：
D O I：
10.1116/1.569104
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：134 / 137
页数：4
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