HIGH-RATE MAGNETRON SPUTTERING OF HIGH TC NB3SN FILMS

被引：49
|
作者：
WU, CT [1 ]
KAMPWIRTH, RT [1 ]
HAFSTROM, JW [1 ]
机构：
[1] ARGONNE NATL LAB,ARGONNE,IL 60439
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期
关键词：
D O I：
10.1116/1.569104
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：134 / 137
页数：4
相关论文
共 50 条
  • [21] INFLUENCES OF DC BIAS ON ALUMINUM FILMS PREPARED WITH A HIGH-RATE MAGNETRON SPUTTERING CATHODE
    PARK, YH
    ZOLD, FT
    SMITH, JF
    THIN SOLID FILMS, 1985, 129 (3-4) : 309 - 314
  • [22] INVESTIGATION OF HIGH-RATE MAGNETRON SPUTTERING OF NIOBIUM FILMS FOR JOSEPHSON INTEGRATED-CIRCUITS
    VILLEGIER, JC
    VELER, JC
    IEEE TRANSACTIONS ON MAGNETICS, 1983, 19 (03) : 946 - 950
  • [23] Deposition of Superconducting Nb3Sn Coatings Using Multiple Magnetron Sputtering Techniques
    Yurjev, Yuriy
    Savelev, Aleksandr
    Yurjeva, Alena
    Kazimirov, Artem
    Kharisova, Anastasiia
    METALS, 2023, 13 (10)
  • [24] HIGH-RATE MAGNETRON SPUTTERING FOR METALLIZING SEMICONDUCTOR-DEVICES
    HOFFMAN, V
    SOLID STATE TECHNOLOGY, 1976, 19 (12) : 57 - &
  • [25] High-rate reactive dc magnetron sputtering of ZrOx coatings
    Wong, MS
    Chia, WJ
    Yashar, P
    Schneider, JM
    Sproul, WD
    Barnett, SA
    SURFACE & COATINGS TECHNOLOGY, 1996, 86 (1-3): : 381 - 387
  • [26] REACTIVE HIGH-RATE SPUTTERING BY THE DC-MAGNETRON TECHNIQUE
    STEENBECK, K
    STEINBEISS, E
    VAKUUM-TECHNIK, 1989, 38 (08): : 244 - 253
  • [27] HIGH-RATE DEPOSITION OF TRANSPARENT CONDUCTING FILMS BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING OF CD2SN ALLOY
    MANIV, S
    MINER, C
    WESTWOOD, WD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 195 - 198
  • [28] SELF-SPUTTERING PHENOMENA IN HIGH-RATE COAXIAL CYLINDRICAL MAGNETRON SPUTTERING
    HOSOKAWA, N
    TSUKADA, T
    MISUMI, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 143 - 146
  • [29] Low-temperature and high-rate deposition of SrTiO3 thin films by RF magnetron sputtering
    Kohara, N
    Yoshida, A
    Sawada, T
    Kitagawa, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (01): : 172 - 177
  • [30] NB3SI PREPARED BY HIGH-RATE SPUTTERING FOLLOWED BY QUENCHING
    OGUSHI, T
    NISHI, K
    NAGAI, H
    NUMATA, T
    OBARA, K
    JOURNAL OF LOW TEMPERATURE PHYSICS, 1980, 41 (1-2) : 13 - 23
12345