GLOW-DISCHARGE ASPECTS OF PLASMA DEPOSITION AND PLASMA ETCHING

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作者：

VOSSEN, JL ^{[1
]}

机构：

[1] RCA,PRINCETON,NJ 08540

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 03期

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中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

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页码：C155 / C155

页数：1

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