SEMICONDUCTOR MICROCRYSTALS DOPED IN SILICA GLASS THIN-FILMS PREPARED BY RF-SPUTTERING

被引：0

作者：

NASU, H

机构：

来源：

BRITISH CERAMIC TRANSACTIONS AND JOURNAL | 1990年 / 89卷 / 06期

关键词：

D O I：

暂无

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Semiconductor microcrystals, such as CdSe, CdTe, GaAs and Ge can be successfully doped in silica glass thin films by an rf-sputtering technique. The size of the microcrystals was strongly dependent on sputtering conditions. From optical absorption spectra, the quantum size effect could be seen from the crystals doped in the films, and the shift of the absorption edge basically satisfied the theoretical relationship with respect to the mean microcrystal size.

引用

页码：225 / 226

页数：2

共 50 条

[41] CRYSTALLINE INSE FILMS PREPARED BY RF-SPUTTERING TECHNIQUE
SHIGETOMI, S
IKARI, T
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (12B): : L2127 - L2129
[42] CONDUCTIVE AND TRANSPARENT AL-DOPED ZNO THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING
CHEN, YI
DUH, JG
MATERIALS CHEMISTRY AND PHYSICS, 1991, 27 (04) : 427 - 439
[43] INDIUM-DOPED ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING
SHIH, I
QIU, CX
JOURNAL OF APPLIED PHYSICS, 1985, 58 (06) : 2400 - 2401
[44] XPS STUDY OF BI-SR-CA-CU-O SUPERCONDUCTING THIN-FILMS PREPARED BY THE RF-SPUTTERING METHOD
FUKUI, A
ENOMOTO, H
NATSUME, H
TAKANO, Y
MORI, N
OZAKI, H
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1989, 28 (02): : L233 - L235
[45] CRYSTAL ORIENTATION OF YBA2CU3O7-Y THIN-FILMS PREPARED BY RF-SPUTTERING
ARIKAWA, T
ITOZAKI, H
HARADA, K
HIGAKI, K
TANAKA, S
YAZU, S
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (12): : L2199 - L2202
[46] BRIGHT ELECTROLUMINESCENCE FROM ZNS-MN THIN-FILMS GROWN BY RF-SPUTTERING
OHNISHI, H
IWASE, R
YAMASAKI, Y
SHIRASAKA, Y
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C489 - C489
[47] VOLTAIC EFFECT OF THE HUMIDITY OF (ZN, CU)O THIN-FILMS DEPOSITED BY RF-SPUTTERING
TANAKA, T
IBARAKI, T
SAITO, I
SINDO, H
TAKADA, S
FUJINAKA, M
THIN SOLID FILMS, 1990, 189 (01) : 9 - 17
[48] Structural and optical properties of lead sulfide thin films prepared by RF-sputtering technique
Alalwan, Maha M.
Saleh, Mahmoud H.
Abu-Kharma, Mahmoud H.
INDIAN JOURNAL OF PHYSICS, 2024,
[49] THIN-FILMS OF CUINSE2 PRODUCED BY RF-SPUTTERING WITH INTENTIONAL OXYGEN DOPING
YAMAGUCHI, T
MATSUFUSA, J
KABASAWA, H
YOSHIDA, A
JOURNAL OF APPLIED PHYSICS, 1991, 69 (11) : 7714 - 7719
[50] PREPARATION OF WCX THIN-FILMS BY RF-SPUTTERING AND THEIR ELECTROCATALYTIC PROPERTY FOR ANODIC METHANOL OXIDATION
MACHIDA, K
ENYO, M
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (03) : 871 - 876

← 1 2 3 4 5 →