PHOTOINDUCED DIFFUSION OF AG IN GEXSE1-X GLASS

被引：16
|
作者：
LEUNG, W [1 ]
CHEUNG, N [1 ]
NEUREUTHER, AR [1 ]
机构：
[1] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720
来源：
APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 06期
关键词：
D O I：
10.1063/1.95586
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：543 / 545
页数：3
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