RAPID GROWTH OF THIN-FILM SILICON-OXIDES

被引：0
|
作者：
GRANT, G [1 ]
BROWN, G [1 ]
SHU, J [1 ]
LEE, E [1 ]
REYNOLDS, J [1 ]
机构：
[1] TEXAS INSTRUMENTS INC,DALLAS,TX 75265
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 11期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C469 / C469
页数：1
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