RAPID GROWTH OF THIN-FILM SILICON-OXIDES

被引：0

|

作者：

GRANT, G ^{[1
]}

BROWN, G ^{[1
]}

SHU, J ^{[1
]}

LEE, E ^{[1
]}

REYNOLDS, J ^{[1
]}

机构：

[1] TEXAS INSTRUMENTS INC,DALLAS,TX 75265

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 11期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：C469 / C469

页数：1

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