HYDROGEN ADSORPTION AND SURFACE-STRUCTURES OF SILICON

被引：253

作者：

IBACH, H ^{[1
]}

ROWE, JE ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

SURFACE SCIENCE | 1974年 / 43卷 / 02期

关键词：

D O I：

10.1016/0039-6028(74)90271-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：481 / 492

页数：12

共 24 条

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LEY, L ;

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[7] ROUGHNESS OF CLEAVED SEMICONDUCTOR SURFACES [J].

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SURFACE SCIENCE, 1973, 36 (01) :109-122

[8] ADSORPTION OF OXYGEN ON SILICON (111) SURFACES .1. [J].

IBACH, H ;

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LUTH, H .

SURFACE SCIENCE, 1973, 38 (02) :433-454

[9]

IBACH H, TO BE PUBLISHED

[10] ELECTRON BEAM-ADSORBATE INTERACTIONS ON SILICON SURFACES [J].

JOYCE, BA ;

NEAVE, JH .

SURFACE SCIENCE, 1973, 34 (02) :401-419

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